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  4. The influence of doping gradient on temperature dependence of threshold current density of GaAs-injection lasers
 
research article

The influence of doping gradient on temperature dependence of threshold current density of GaAs-injection lasers

Salathe, R.
•
Mohn, E.
1971
Solid-State Electronics

On selected GaAs laser diodes, prepared by an epitaxial solution growth method, the temperature dependence of threshold current density and the net density gradient at the p-n junction have been measured. The relationship between these two parameters has been examined and compared with different theoretical results. Assuming a linearly graded doping profile in the junction region a good quantitative agreement is obtained between theory and the experimental results

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Type
research article
DOI
10.1016/S0038-1101(71)80010-2
Author(s)
Salathe, R.
Mohn, E.
Date Issued

1971

Published in
Solid-State Electronics
Volume

14

Issue

9

Start page

843

End page

7

Subjects

gallium arsenide

•

III-V semiconductors

•

semiconductor lasers

•

semiconductor materials

•

doping gradient

•

temperature dependence

•

threshold current density

•

GaAs laser diodes

•

epitaxial solution growth method

Note

Univ. Bern, Switzerland

319608

Editorial or Peer reviewed

REVIEWED

Written at

OTHER

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January 20, 2009
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/33898
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