UV-imprint lithography has attracted attentions since its invention in 1996 together with thermal imprint lithography, which are so-called nanoimprint lithography (NIL). One of the characteristics of UV-imprint lithography is that a polymer layer to be structured is cured by UV exposure, and therefore the stamp for UV-imprint lithography has to be transparent. In order to establish the UV-imprinting process with the newly introduced system in CMI, we evaluated the process with two different photo-sensitive polymers that have different viscosities. Various nanostructures were realized by using both polymers, and their smallest feature is 67 nm. (Structure size depends on a stamp to be used.)