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research article

Role of the gate in ballistic nanowire SOI MOSFETs

Mangla, A.  
•
Sallese, Jean-Michel  
•
Sampedro, C.
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2015
Solid-State Electronics

In this paper we report the results of Monte-Carlo simulations performed on double-gate ballistic MOSFETs with a geometry such that the gates overlap only a fraction of the channel. We present a qualitative analysis of the simulation results highlighting the similarities and differences between ballistic devices of 10 nm and 100 nm channel length, in an attempt to understand the electrostatics in a ballistic channel, especially the influence of the gate, source and drain terminals on the channel. (C) 2015 Elsevier Ltd. All rights reserved.

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Type
research article
DOI
10.1016/j.sse.2015.02.010
Web of Science ID

WOS:000358970000005

Author(s)
Mangla, A.  
Sallese, Jean-Michel  
Sampedro, C.
Gamiz, F.
Enz, C.  
Date Issued

2015

Publisher

Elsevier

Published in
Solid-State Electronics
Volume

112

Start page

24

End page

28

Subjects

Ballistic

•

Double-gate

•

Partial gate

•

MOSFET

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

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ICLAB  
EDLAB  
Available on Infoscience
September 28, 2015
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/118685
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