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patent

Negative capacitance semiconductor sensor

Ionescu, Mihai Adrian  
•
Bellando, Francesco  
•
Saeidi, Ali  
2020

The present invention relates to a semiconductor sensor (1) comprising: a source element (17, 19); a drain element (21, 23); a semiconductor channel element (25) between the source element (17, 19) and the drain element (21, 23) for forming an electrically conductive channel; a first insulator (27) between the semiconductor channel element and a solution (3) to be sensed; a reference electrode (9) configured to be in contact with the solution (3), the reference electrode (9) being configured to set an electric potential of the solution; a bias voltage source (5) for generating an external sensor bias voltage for electrically biasing the reference electrode (9); and a sensing surface (27, 37) for interacting with the solution (3) comprising analytes for generating a surface potential change at the sensing surface dependent on the concentration of the analytes in the solution. The sensor further comprises a ferroelectric capacitance element (7) between the first insulator (27) and the bias voltage source (5) for generating a negative capacitance for providing a differential gain between the external sensor bias voltage and an internal sensor bias voltage sensed at a surface of the channel element (25) facing the first insulator (27) or ferroelectric capacitance element (7).

  • Details
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Type
patent
EPO Family ID

64744589

Author(s)
Ionescu, Mihai Adrian  
Bellando, Francesco  
Saeidi, Ali  
Note

Alternative title(s) : (de) Negativ-kapazitiver halbleitersensor (fr) Capteur à semi-conducteur à capacité négative

TTO classification

TTO:6.1880

EPFL units
AVP-R-TTO  
NANOLAB  
IdentifierCountry codeKind codeDate issued

EP3671199

EP

B1

2022-05-25

US11289601

US

B2

2022-03-29

EP3671199

EP

A1

2020-06-24

US2020194592

US

A1

2020-06-18

Available on Infoscience
July 2, 2020
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/169762
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