conference paper

Comparison of VHF, RF and DC Plasma Excitation for a-Si:H Deposition with Hydrogen Dilution

Platz, R.
•
Hof, C.
•
Rech, B.
Show more
1998
MRS Proceedings
Loading...
Thumbnail Image
Name

paper_277.pdf

Access type

openaccess

Size

103.95 KB

Format

Adobe PDF

Checksum (MD5)

9b7230188d6c358eb1827681fb6d7e0b