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  4. High-speed laser chemical vapor deposition of copper: a search for optimum conditions
 
research article

High-speed laser chemical vapor deposition of copper: a search for optimum conditions

Markwalder, B.
•
Widmer, M.
•
Braichotte, D.
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1989
Journal of Applied Physics

The photothermal laser-induced chem. vapor deposition of Cu was studied as a function of the writing speed, the light intensity, and the diam. of the focal spot on the substrate, at three different pressures of the Cu bishexafluoroacetylacetonate precursor. The height, the width, and the elec. cond. of the deposited metal stripes are measured. The metalorg. vapor pressure is the key variable for attaining high writing speeds. Copper stripes have been obtained at 1 mm s-1.

  • Details
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Type
research article
DOI
10.1063/1.342817
Author(s)
Markwalder, B.
Widmer, M.
Braichotte, D.
Van den Bergh, H.  
Date Issued

1989

Published in
Journal of Applied Physics
Volume

65

Issue

6

Start page

2470

End page

2474

Subjects

14781-45-4 Role: RCT (Reactant)

•

RACT (Reactant or reagent) (decompn. of

•

in laser writing of copper); 7440-50-8 (Copper) Role: PEP (Physical

•

engineering or chemical process)

•

PROC (Process) (laser chem. vapor deposition of

•

high-speed

•

in hybrid circu

•

copper chem vapor deposition laser optimization

Note

Copyright 2003 ACS

CAPLUS

AN 1989:164187

CAN 110:164187

76-2

Electric Phenomena

Lab. Chim. Tech.,Ec. Polytech. Fed. Lausanne,Lausanne,Switz. FIELD URL:

Journal

JAPIAU

written in English.

Process optimization (of high-speed laser chem.-vapor deposition of copper in hybrid circuitry fabrication); Electric circuits (hybrid, optimization of high-speed laser chem.-vapor deposition of copper in fabrication of)

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
LPAS  
Available on Infoscience
February 1, 2011
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/63674
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