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  4. In-Plane Polarities of Nonpolar Wurtzite Epitaxial Films Deposited on m- and r-plane Sapphire Substrates
 
research article

In-Plane Polarities of Nonpolar Wurtzite Epitaxial Films Deposited on m- and r-plane Sapphire Substrates

Vennegues, Philippe
•
Zhu, Tiankai
•
Bougrioua, Zahia
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2009
Japanese Journal of Applied Physics

The in-plane polarities of GaN and ZnO non-polar films deposited on r- and m-sapphire are compared. The polarity is unique on r-sapphire and mixed on m-sapphire because the direction on the substrate surface parallel to the wurztite c-direction is polar in the first case and non-polar in the second case. Furthermore, on r-sapphire where GaN and ZnO have a unique polarity, the directions of the polar c-axis relative to a reference sense in the substrate surface are opposite for both materials. This difference may be related to the nitridation which is the first step of the of III-nitride growth. (C) 2009 The Japan Society of Applied Physics

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Type
research article
DOI
10.1143/jjap.48.090211
Author(s)
Vennegues, Philippe
Zhu, Tiankai
Bougrioua, Zahia
Martin, Denis
Zuniga-Perez, Jesus
Grandjean, Nicolas  
Date Issued

2009

Published in
Japanese Journal of Applied Physics
Volume

48

Issue

9

Article Number

0211

Subjects

Molecular-Beam Epitaxy

•

Transmission Electron-Microscopy

•

Gan Films

•

Gallium Nitride

•

Growth

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
LASPE  
Available on Infoscience
October 5, 2010
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/55141
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