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  4. Efficient suppression of back electron/hole recombination in cobalt phosphate surface-modified undoped bismuth vanadate photoanodes
 
research article

Efficient suppression of back electron/hole recombination in cobalt phosphate surface-modified undoped bismuth vanadate photoanodes

Ma, Yimeng
•
Le Formal, Florian  
•
Kafizas, Andreas
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2015
Journal of Materials Chemistry A

In this paper, we compared for the first time the dynamics of photogenerated holes in BiVO4 photoanodes with and without CoPi surface modification, employing transient absorption and photocurrent measurements on microsecond to second timescales. CoPi surface modification is known to cathodically shift the water oxidation onset potential; however, the reason for this improvement has not until now been fully understood. The transient absorption and photocurrent data were analyzed using a simple kinetic model, which allows quantification of the competition between electron/hole recombination and water oxidation. The results of this model are shown to be in excellent agreement with the measured photocurrent data. We demonstrate that the origin of the improvement of photocurrent onset resulting from CoPi treatment is primarily due to retardation of back electron/hole recombination across the space charge layer; no evidence of catalytic water oxidation via CoPi was observed.

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Type
research article
DOI
10.1039/c5ta05826k
Web of Science ID

WOS:000363145500028

Author(s)
Ma, Yimeng
Le Formal, Florian  
Kafizas, Andreas
Pendlebury, Stephanie R.
Durrant, James R.
Date Issued

2015

Publisher

Royal Society of Chemistry

Published in
Journal of Materials Chemistry A
Volume

3

Issue

41

Start page

20649

End page

20657

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
ISIC  
Available on Infoscience
December 2, 2015
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/121339
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