Publication:

Reliable Langmuir Blodgett colloidal masks for large area nanostructure realization

cris.lastimport.scopus

2024-08-09T13:19:29Z

cris.lastimport.wos

2024-08-01T03:48:38Z

cris.legacyId

278495

cris.virtual.author-scopus

22962463800

cris.virtual.department

SMT-ENS

cris.virtual.department

NAM

cris.virtual.parent-organization

IEM

cris.virtual.parent-organization

STI

cris.virtual.parent-organization

EPFL

cris.virtual.sciperId

252161

cris.virtual.sciperId

117095

cris.virtual.sciperId

159310

cris.virtual.unitId

10373

cris.virtual.unitManager

Moser, Christophe

cris.virtual.unitManager

Martin, Olivier

cris.virtual.unitManager

Raball, Beatrice

cris.virtualsource.author-scopus

6db73d21-1d89-4a80-afb3-384ff46b7b30

cris.virtualsource.author-scopus

32d19cc0-92bb-4d4c-a5ca-b5af1b2a17a9

cris.virtualsource.author-scopus

9f11c038-5b8a-4565-b1c2-7929b25c6adb

cris.virtualsource.department

6db73d21-1d89-4a80-afb3-384ff46b7b30

cris.virtualsource.department

32d19cc0-92bb-4d4c-a5ca-b5af1b2a17a9

cris.virtualsource.department

9f11c038-5b8a-4565-b1c2-7929b25c6adb

cris.virtualsource.orcid

6db73d21-1d89-4a80-afb3-384ff46b7b30

cris.virtualsource.orcid

32d19cc0-92bb-4d4c-a5ca-b5af1b2a17a9

cris.virtualsource.orcid

9f11c038-5b8a-4565-b1c2-7929b25c6adb

cris.virtualsource.parent-organization

b5c341f9-5258-4bdb-b2a0-979ebc0ed32a

cris.virtualsource.parent-organization

b5c341f9-5258-4bdb-b2a0-979ebc0ed32a

cris.virtualsource.parent-organization

b5c341f9-5258-4bdb-b2a0-979ebc0ed32a

cris.virtualsource.parent-organization

b5c341f9-5258-4bdb-b2a0-979ebc0ed32a

cris.virtualsource.rid

6db73d21-1d89-4a80-afb3-384ff46b7b30

cris.virtualsource.rid

32d19cc0-92bb-4d4c-a5ca-b5af1b2a17a9

cris.virtualsource.rid

9f11c038-5b8a-4565-b1c2-7929b25c6adb

cris.virtualsource.sciperId

6db73d21-1d89-4a80-afb3-384ff46b7b30

cris.virtualsource.sciperId

32d19cc0-92bb-4d4c-a5ca-b5af1b2a17a9

cris.virtualsource.sciperId

9f11c038-5b8a-4565-b1c2-7929b25c6adb

cris.virtualsource.unitId

b5c341f9-5258-4bdb-b2a0-979ebc0ed32a

cris.virtualsource.unitManager

1602fdb4-b552-4d9c-8876-56be93fddef7

cris.virtualsource.unitManager

b5c341f9-5258-4bdb-b2a0-979ebc0ed32a

cris.virtualsource.unitManager

b5c341f9-5258-4bdb-b2a0-979ebc0ed32a

datacite.rights

restricted

dc.contributor.author

Thangamuthu, Madasamy

dc.contributor.author

Santschi, Christian

dc.contributor.author

Martin, Olivier J.F.

dc.date.accessioned

2020-07-08T17:24:06

dc.date.created

2020-07-08

dc.date.issued

2020-09-01

dc.date.modified

2025-04-30T12:46:00.271613Z

dc.description.abstract

The fabrication of highly ordered nanostructures over large areas is key for many technologies and colloidal lithography using the Langmuir Blodgett technique appears a simple and straightforward way of reaching that goal. While this technique has been widely reported in the literature, its straightforward implementation to obtain well-ordered nanostructures over very large areas is far from obvious, since many key technical subtleties are rarely documented. Here, we describe an easily and highly reproducible recipe and detail aspects such as beads preparation, composition of the subphase, beads transfer method, influence of the spreading agent and the barrier compression rate, as well as monolayer transfer to the substrate. A drastic improvement in the polystyrene self-assembly at the air-water interface is observed after removing the common salt and surfactant molecules from commercial polystyrene beads suspensions. Similarly, an electrolyte free water subphase enhances the hexagonal arrangement of the beads and the long-range order. The beads sinking into the bulk of the water is reduced by dispensing the beads using a glass slide and the polystyrene suspension prepared using water and ethanol at 1:1 mitigates repulsive and attractive forces, leading to excellent hexagonal close packed arrangement. By following the recipe shown here, the reader should easily fabricate lattice-like colloidal masks for producing nanostructures over larger areas.

dc.description.sponsorship

NAM

dc.identifier.doi

10.1016/j.tsf.2020.138195

dc.identifier.uri

https://infoscience.epfl.ch/handle/20.500.14299/169899

dc.relation

https://infoscience.epfl.ch/record/278495/files/Reliable Langmuir Blodgett colloidal masks for large area nanostructure realization.pdf

dc.relation.journal

Thin Solid Films

dc.subject

Nanophotonics

dc.subject

Plasmonics

dc.title

Reliable Langmuir Blodgett colloidal masks for large area nanostructure realization

dc.type

text::journal::journal article::research article

dspace.entity.type

Publication

dspace.file.type

Publisher's version

dspace.legacy.oai-identifier

oai:infoscience.epfl.ch:278495

epfl.curator.email

alessandra.bianchi@epfl.ch

epfl.lastmodified.email

beatrice.raball@epfl.ch

epfl.legacy.itemtype

Journal Articles

epfl.legacy.submissionform

ARTICLE

epfl.oai.currentset

OpenAIREv4

epfl.oai.currentset

STI

epfl.oai.currentset

article

epfl.peerreviewed

REVIEWED

epfl.publication.version

http://purl.org/coar/version/c_970fb48d4fbd8a85

epfl.writtenAt

EPFL

oaire.citation.articlenumber

138195

oaire.citation.volume

709

oaire.version

http://purl.org/coar/version/c_970fb48d4fbd8a85

Files

Original bundle

Now showing 1 - 1 of 1
Loading...
Thumbnail Image
Name:
Reliable Langmuir Blodgett colloidal masks for large area nanostructure realization.pdf
Size:
8.9 MB
Format:
Adobe Portable Document Format

License bundle

Now showing 1 - 1 of 1
Loading...
Thumbnail Image
Name:
license.txt
Size:
1.71 KB
Format:
Item-specific license agreed to upon submission
Description:

Collections