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  4. Oxygen diluted hexamethyldisiloxane plasmas investigated by means of in situ infrared absorption spectroscopy and mass spectrometry
 
research article

Oxygen diluted hexamethyldisiloxane plasmas investigated by means of in situ infrared absorption spectroscopy and mass spectrometry

Magni, D.
•
Deschenaux, C.
•
Hollenstein, C.  
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2001
Journal of Physics D-Applied Physics

The gas phase species produced in rf plasmas of hexamethyldisiloxane (HMDSO), Si2O(CH3)(6), diluted with oxygen, have been investigated. The complementarity of Fourier transform infrared absorption spectroscopy and mass spectrometry allows the determination of the most abundant neutral components present in the discharge. The measurements reveal that methyl groups (CH3), abundantly formed by the dissociation of the HMDSO molecule, are the precursor for the most abundant species which stem from two kinds of reaction. The first kind of reaction is combustion of CH3 by oxygen-producing formaldehyde (COH2), formic acid (CO2H2), carbon monoxide (CO), carbon dioxide (CO2) and water. It is shown that high mass carbonated radicals, such as SixOyCzHt, first diffuse to the surface and then the carbon is removed by oxygen etching to form CO2. The second is hydrocarbon chemistry promoted by CH3, producing mainly hydrogen (H-2), methane (CH4) and acetylene (C2H2).

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Type
research article
DOI
10.1088/0022-3727/34/1/315
Author(s)
Magni, D.
•
Deschenaux, C.
•
Hollenstein, C.  
•
Creatore, A.
•
Fayet, P.
Date Issued

2001

Published in
Journal of Physics D-Applied Physics
Volume

34

Issue

1

Start page

87

End page

94

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
CRPP  
SPC  
Available on Infoscience
April 16, 2008
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/21725
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