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  4. Copper TSV-Based Die-Level Via-Last 3D Integration Process with Parylene-C Adhesive Bonding Technique
 
conference paper

Copper TSV-Based Die-Level Via-Last 3D Integration Process with Parylene-C Adhesive Bonding Technique

Kucuk Eroglu, Seniz E.
•
Woo-Yeong, Cho
•
Leblebici, Yusuf  
2016
2016 IEEE International 3D Systems Integration Conference (3DIC)
The IEEE International Conference on 3D System Integration (3DIC)

This paper presents a die-level post-CMOS processing protocol for multi-layer homogeneous 3D integration with adhesive bonding technique using parylene-C as an intermediate bonding layer and sidewall passivation material. This protocol was used to fabricate 4-layer CMOS memory chip stacks, which were then packaged and tested using time domain reflectometry (TDR) measurement technique. The results have showed that the characteristic inductance values were improved for 3D integrated memory chips due to the elimination of bonding wires.

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Type
conference paper
DOI
10.1109/3DIC.2016.7970016
Author(s)
Kucuk Eroglu, Seniz E.
Woo-Yeong, Cho
Leblebici, Yusuf  
Date Issued

2016

Published in
2016 IEEE International 3D Systems Integration Conference (3DIC)
Start page

1

End page

5

Subjects

3D integration

•

adhesive bonding

•

copper TSV

•

die-level integration

•

parylene-C

•

post-CMOS processing

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
LSM  
Event nameEvent placeEvent date
The IEEE International Conference on 3D System Integration (3DIC)

San Francisco, California, USA

November 9-11, 2016

Available on Infoscience
November 30, 2016
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/131701
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