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  4. Quantum confined Stark effect due to built-in internal polarization fields in (Al,Ga)N/GaN quantum wells
 
research article

Quantum confined Stark effect due to built-in internal polarization fields in (Al,Ga)N/GaN quantum wells

Leroux, M.
•
Grandjean, N.  
•
Laugt, M.
Show more
1998
Physical Review B

(Al,Ga)N/GaN quantum wells have been studied by temperature-dependent luminescence and reflectivity. The samples were grown by molecular beam epitaxy on (0001) sapphire substrates, and well widths were varied from 3 to 15 monolayers (ML's) with a 2-ML increment, thus providing a reliable data set for the study of the well width dependence of transition energies. The latter shows a strong quantum confined Stark effect for wide wells, and an internal electric-field strength of 450 kV/cm is deduced. X-ray diffraction performed on the same samples shows that the GaN layers are nearly unstrained, whereas the (AI,Ga)N barriers are pseudomorphically strained on GaN. We conclude that the origin of the electric field is predominently due to spontaneous polarization effects rather than a piezoelectric effect in the well material. [S0163-1829(98)50944-7].

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Type
research article
DOI
10.1103/PhysRevB.58.R13371
Author(s)
Leroux, M.
•
Grandjean, N.  
•
Laugt, M.
•
Massies, J.
•
Gil, B.
•
Lefebvre, P.
•
Bigenwald, P.
Date Issued

1998

Published in
Physical Review B
Volume

58

Issue

20

Start page

13371

End page

13374

Subjects

MOLECULAR-BEAM EPITAXY

•

OPTICAL-PROPERTIES

•

WURTZITE GAN

•

CONSTANTS

•

HETEROSTRUCTURE

•

DIFFRACTION

•

TRANSITIONS

•

SAPPHIRE

•

NITRIDE

•

WIDTHS

Editorial or Peer reviewed

REVIEWED

Written at

OTHER

EPFL units
LASPE  
Available on Infoscience
October 5, 2010
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/54861
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