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  4. Non-hysteretic punchthrough impact ionization MOS (PIMOS) transistor: Application to abrupt inverter and NDR circuits
 
conference paper

Non-hysteretic punchthrough impact ionization MOS (PIMOS) transistor: Application to abrupt inverter and NDR circuits

Pott, V.  
•
Moselund, K. E.  
•
Ionescu, A. M.  
2008
Solid-State Device Research Conference, 2008. ESSDERC 2008. 38th European

The recently proposed PIMOS transistor can offer, by appropriate operation, non-hysteretic abrupt off-on transitions due to impact ionization if the action of its parasitic bipolar transistor is minimized. This work proposes non-hysteretic abrupt inverter circuits based on <10 mV/decade room temperature current switching and a tunable negative differential resistance based on punch-through impact ionization MOS transistors (PIMOS) when parasitic bipolar action is cancelled by choosing an appropriate drain voltage. The proposed circuit architectures are compatible with silicon CMOS nodes. The very abrupt non-hysteretic inverter shows gain of the order of -100 in the transition region of the voltage transfer characteristic (VTC). The NDR circuit exhibits tunable peak-to-valley PVR values and a negative resistance in the range of hundreds of kOmega.

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Type
conference paper
DOI
10.1109/ESSDERC.2008.4681760
Web of Science ID

WOS:000262973300074

Author(s)
Pott, V.  
Moselund, K. E.  
Ionescu, A. M.  
Date Issued

2008

Published in
Solid-State Device Research Conference, 2008. ESSDERC 2008. 38th European
Start page

310

End page

313

Subjects

MOSFET

•

MOSFET circuits

•

invertors

•

abrupt inverter circuits

•

drain voltage

•

nonhysteretic punchthrough impact ionization MOS transistor

•

parasitic bipolar action

•

room temperature current switching

•

temperature 293 K to 298 K

•

tunable negative differential resistance

•

voltage transfer characteristic

Editorial or Peer reviewed

REVIEWED

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July 15, 2009
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/41345
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