90 MHz nanomechanical structures fabricated by stencil deposition and dry etching

Kim, G Mvan den Boogaart, M A FKawai, SKawakatsu, HBrugger, J2007-04-132007-04-13200310.1109/SENSOR.2003.1215616https://infoscience.epfl.ch/handle/20.500.14299/4636We present a simple method for fabricating fast resonating (90 MHz) nanomechanical elements based on the local deposition through a miniaturized shadow mask (nanostencil), followed by dry etching to release the structure from the substrate. The measured resonance frequency of a fabricated nanomechanical structure shows high resonance frequency up to 90 MHz. This resistless and dry process provides a flexible, rapid and stiction-free approach for the fabrication of ultra-fast resonating elements in various materials.90 MHz nanomechanical structures fabricated by stencil deposition and dry etchingtext::conference output::conference proceedings::conference paper