High Tunning Range AISi RF MEMS Capacitors Fabricated with Sacrificial Amorphous Silicon Surface Micromachining

Fritschi, R.Frédérico, S.Hibert, C.Flückiger, Ph.Renaud, Ph.Tsamados, D.Boussey, J.Chovet, A.Udrea, F.Curty, J.-P.Dehollain, C.Declercq, M.Ionescu, A. M.2007-10-102007-10-102007-10-10200310.1016/j.mee.2004.03.015https://infoscience.epfl.ch/handle/20.500.14299/12781WOS:0002221454000795303High Tunning Range AISi RF MEMS Capacitors Fabricated with Sacrificial Amorphous Silicon Surface Micromachiningtext::conference output::conference proceedings::conference paper