Grafting of Oxidized Silicon Nitride Insulator for the Preparation of ISFET Monolayer Membrane

Perrot, H.Jaffrezic-Renault, N.Eymin, M. J.Gagnaire, A.Duvault, J. L.Hollinger, G.de Rooij, N. F.Racine, G.-A.Jeanneret, S.Maaref, A.2009-05-122009-05-122009-05-121990https://infoscience.epfl.ch/handle/20.500.14299/39681Grafting of Oxidized Silicon Nitride Insulator for the Preparation of ISFET Monolayer Membranetext::conference output::conference proceedings::conference paper