Interferometric fabrication of modulated submicrometer gratings in photoresist

Ehbets, P.Herzig, H. P.Nussbaum, Ph.Blattner, P.Dändliker, R.2009-04-222009-04-222009-04-22199510.1364/AO.34.002540https://infoscience.epfl.ch/handle/20.500.14299/37660Interferometric fabrication of modulated submicrometer gratings in photoresisttext::journal::journal article::research article