Faizan, MuhammadDe Pastina, AnnalisaYandrapalli, SoumyaTurner, Patrick J.Hammond, Robert B.Plessky, VictorVillanueva, Luis Guillermo2020-07-092020-07-092020-07-092019-01-0110.1109/TRANSDUCERS.2019.8808179https://infoscience.epfl.ch/handle/20.500.14299/169924WOS:000539487000443This work presents the fabrication of a MEMS resonant device which addresses the need for high quality and miniaturized RF filters in the 3-6 GHz range for 5th generation (5G) mobile networks. The 4-mask fabrication process is based on the definition of interdigitated Aluminum (Al) electrodes on a suspended membrane of 400 nm-thick Z-cut lithium niobate (LiNbO3). Devices are fabricated with a yield of 70% and exhibit high electromechanical coupling (k(t)(2)) and quality factor (Q) up to 28% and 300, respectively, for frequencies around 5 GHz.memsmicrofabricationlithium niobatefilterselectron beam (e-beam) lithographytext::conference output::conference proceedings::conference paper