Vazquez Mena, OscarVillanueva, GuillermoSavu, VeronicaSidler, Katrinvan den Boogaart, M. A. F.Brugger, Juergen2008-09-102008-09-102008-09-10200810.1021/nl801778thttps://infoscience.epfl.ch/handle/20.500.14299/27811WOS:00026088860002213681Aluminum and gold nanowires were fabricated using 100 mm stencil wafers containing nanoslits fabricated with a focused ion beam. The stencils were aligned and the nanowires deposited on a substrate with predefined electrical pads. The morphology and resistivity of the wires were studied. Nanowires down to 70-nm wide and 5 µm long have been achieved showing a resistivity of 10 µΩcm for Al and 5 µΩcm for Au and maximum current density of ~108 A/cm2. This proves the capability of stencil lithography for the fabrication of metallic nanowires on a full wafer scale.Stencil lithographymetallic nanowiresresistivitytext::journal::journal article::research article