Stebler, C.Pfeffer, T.Staufer, U.de Rooij, N. F.2009-05-122009-05-122009-05-12199910.1016/S0167-9317(99)00118-5https://infoscience.epfl.ch/handle/20.500.14299/39895We report about a new process we have developed to fabricate miniaturized double layer octupoles that can be operated as electrostatic scanner/stigmators for charged particle beams. The fabrication process is based on deep reactive ion etching (DRIE) and anodic bonding. In order to use the octupoles in a microcolumn set-up, they have to be ultra-high vacuum (UHV) compatible. The microfabricated octupoles have been incorporated into our microcolumn test system to investigate the deflection quality on a low energy electron beam. The presented images demonstrate the fully functional operation of a double layer octupole as pre-lens deflector of a microcolumn.text::journal::journal article::research article