Kim, G Mvan den Boogaart, M A FKawai, SKawakatsu, HBrugger, J2007-03-022007-03-022007-03-022003https://infoscience.epfl.ch/handle/20.500.14299/3391We present a simple method for fabricating nanomechanical elements with ultra high resonance frequency. The process is based on local deposition through a miniaturized shadow mask (nanostencil), followed by dry etching to release the structure from the substrate. The resonance frequency of a fabricated Al/SiN nanomechanical structure has been measured using a hetrodyne doppler interferometer to be up to 90 MHz. This resistless and dry process provides a flexible, rapid and stiction-free approach for the fabrication of high frequency resonating elements in various materials.text::conference output::conference poster not in proceedings