Multone, XavierAfra, BamdadKuzminykh, YuryHoffmann, Patrik2012-07-102012-07-102012-07-10200910.1149/1.3207711https://infoscience.epfl.ch/handle/20.500.14299/83728The deposition of amorphous alumina (Al2O3) films on four inch wafers with high deposition rate (up to 50 nm/min) by an advanced HV-CVD technique is discussed. Amorphous nature of the films is confirmed by X-ray diffraction. Refractive index of the deposited alumina can be adjusted in the large range (1.3-1.62@633 nm) by varying the substrate temperate during the deposition. The films are highly transparent. The density and stoichiometry of the deposits are also influenced by deposition conditions. Presence of -OH groups is observed in some cases.text::conference output::conference proceedings::conference paper