High-yield, wafer-scale fabrication of ultralow-loss, dispersion-engineered silicon nitride photonic circuits

Liu, JunqiuHuang, GuanhaoWang, Rui NingHe, JijunRaja, Arslan S.Riemensberger, JohannLihachev, GrigoryEngelsen, Nils J.Kippenberg, Tobias J.2022-02-142022-02-142022-02-142021-01-0110.1109/CLEO/Europe-EQEC52157.2021.9542550https://infoscience.epfl.ch/handle/20.500.14299/185288WOS:000728078300892High-yield, wafer-scale fabrication of ultralow-loss, dispersion-engineered silicon nitride photonic circuitstext::conference output::conference proceedings::conference paper