Weigand, H.Gautsch, S.Strohmaier, W.Fleischer, M.Staufer, U.de Rooij, N.F.Kern, D.P.2010-01-212010-01-212010-01-21200910.1116/1.3256265https://infoscience.epfl.ch/handle/20.500.14299/45779WOS:000272803400045A different approach in microcolumn design is presented, aiming at a large number of pixels at minimal probe size for the deflected beam. An optimization routine resulted in a seven times magnifying column featuring a more than 7×7 mm2 scan field at 40 mm working distance. Simulations for 1 keV electrons from a field emission source predict an increase in beam size from 85 nm on axis up to only about 200 nm for a beam deflected 3 mm off axis. Within a 1 mm scan field this microcolumn could address over 100 Mpixels of less than 100 nm in size. Tests of this design using the 130 nm electron probe of a scanning electron microscope as the electron source resulted in a beam size of ~930 nm on axis up to ~1000 nm for a beam deflected 3 mm off axis.field emissionmicromechanical devicesscanning electron microscopyLithographySizetext::journal::journal article::research article