Savu, VeronicaNeuser, SamVillanueva, Luis GuillermoVazquez-Mena, OscarSidler, KatrinBrugger, Juergen2009-07-142009-07-14200910.1116/1.3292630https://infoscience.epfl.ch/handle/20.500.14299/41316WOS:000275511800061atomic force microscopycontact resistanceevaporationlithographynanofabricationnanowiresscanning electron microscopyBi NanowiresThin-FilmsLithographyTransportArraysStencilled Conducting Bismuth Nanowirestext::conference output::conference proceedings::conference paper