Effect of the Combination of Femtosecond Laser Pulses Exposure on the Etching Rate of Fused Silica in Hydrofluoric Acid

Mouskeftaras, ABellouard, Y2018-11-082018-11-082018-11-08201810.2961/jlmn.2018.01.0006https://infoscience.epfl.ch/handle/20.500.14299/150152WOS:000439897500006Effect of the Combination of Femtosecond Laser Pulses Exposure on the Etching Rate of Fused Silica in Hydrofluoric Acidtext::journal::journal article::research article