Sidler, K.Villanueva, G.Vazquez-Mena, O.Brugger, J.2009-03-102009-03-102009-03-10200910.1109/SENSOR.2009.5285768https://infoscience.epfl.ch/handle/20.500.14299/35852Minimized Blurring in Stencil Lithography using a Compliant Membranetext::conference output::conference proceedings::conference paper