Jiguet, SébastienBertsch, ArnaudHofmann, H.Renaud, Philippe2005-09-212005-09-21200510.1002/adfm.200400575https://infoscience.epfl.ch/handle/20.500.14299/217049WOS:0002317685000177577A conductive composite photoresist has been developed for the direct photopatterning of electrodes. It is based on a dispersion of silver nanoparticles in SU8, a non-conductive, negative-tone photoresist. Manufactured structures have an electrical conductivity at a low silver content of around 6 vol.-%text::journal::journal article::research article