Beckers, ArnoutJazaeri, FarzanEnz, Christian2019-06-182019-06-182019-06-18201810.1109/CICTA.2018.8706117https://infoscience.epfl.ch/handle/20.500.14299/156897WOS:000469280200018This paper presents an intensive overview of the characterization and modeling of advanced 28-nm hulk and FDSOI CMOS processes operating continuously from room down to deep cryogenic temperature.Engineering, Electrical & ElectronicEngineeringMOSQUITOtext::conference output::conference proceedings::conference paper