Optimisation of the Current Profile with far off-axis ECH Power Deposition in high Elongation TCV Plasmas

Pochelon, A.Camenen, Y.Hofmann, F.Alberti, S.Angioni, C.Goodman, T.P.Henderson, M.A.Nikkola, P.Porte, L.Sauter, O.Scarabosio, A.2008-05-132008-05-132008-05-132002https://infoscience.epfl.ch/handle/20.500.14299/25123Optimisation of the Current Profile with far off-axis ECH Power Deposition in high Elongation TCV Plasmastext::conference output::conference proceedings::conference paper