Comparison of VHF, RF and DC Plasma Excitation for a-Si:H Deposition with Hydrogen Dilution

Platz, R.Hof, C.Rech, B.Wieder, S.Payne, A.Wagner, S.Fischer, D.Shah, A.2009-02-102009-02-102009-02-10199810.1557/PROC-507-565https://infoscience.epfl.ch/handle/20.500.14299/34967Comparison of VHF, RF and DC Plasma Excitation for a-Si:H Deposition with Hydrogen Dilutiontext::conference output::conference proceedings::conference paper