Viallet, B.Ressier, L.Grisolia, J.Peyrade, J.P.Podgajny, R.Amiens, C.van den Boogaart, M.A.F.Brugger, J.2007-09-142007-09-14200710.1002/pssc.200673344https://infoscience.epfl.ch/handle/20.500.14299/12122Gold nanoparticles with hydrophobic surface have been deposited on a silicon substrate chemically patterned by reactive ion etching through a stencil mask and chemical vapour deposition of alkyl silanes. After deposition by dipping and adequate rinsing, the density of nanoparticles was found twice higher on the chemical patterns due to a difference of solvent affinity between patterned and bare silica.text::journal::journal article::research article