KFM detection of quantified charges injected into a thin SiO2 layer containing Si nps embedded by ultra low energy ion implantation using stencil lithography

Dumas, C.Ressier, L.Grisolia, J.Arbouet, A.Paillard, V.BenAssayag, G.Bonafos, C.van den Boogaart, M.A.F.Savu, V.Brugger, J.Normand, P.2009-03-032009-03-032009-03-032008https://infoscience.epfl.ch/handle/20.500.14299/35746KFM detection of quantified charges injected into a thin SiO2 layer containing Si nps embedded by ultra low energy ion implantation using stencil lithographytext::conference output::conference proceedings::conference paper