Belinger, A.Bulkin, P.Delaunay, L.Elyaakoubi, M.Perrin, J.Schmitt, J.Turlot, E.Hollenstein, Ch.Howling, A.A.Sansonnens, L.2008-04-162008-04-162008-04-162001https://infoscience.epfl.ch/handle/20.500.14299/21782Electrostatic charging: Mechanism of substrate charging after plasma processingtext::journal::journal article::research article