Fatigue Resistance of ITI Implant-Abutment Connectors and a comparison of the standard cone with a novel internally keyed design

Periard, J.Wiskott, H. W. A.Mellal, A.Scherrer, S. S.Botsis, J.Belser, U. C.2005-09-142005-09-142005-09-14200210.1034/j.1600-0501.2002.130515.xhttps://infoscience.epfl.ch/handle/20.500.14299/216418WOS:0001797995000143523Fatigue Resistance of ITI Implant-Abutment Connectors and a comparison of the standard cone with a novel internally keyed designtext::journal::journal article::research article