Electron beam induced deposition of rhodium from the precursor [RhCl(PF3)2]2: morphology, structure and chemical composition

Cicoira, F.Leifer, K.Hoffmann, P.Utke, I.Dwir, B.Laub, D.Buffat, P. A.Kapon, E.Doppelt, P.2007-02-152007-02-152007-02-15200410.1016/j.jcrysgro.2004.02.006https://infoscience.epfl.ch/handle/20.500.14299/3081WOS:000221205100039A3. Chemical vapor deposition processesB1. Nano-materialsA4. Electron energy loss spectroscopyA5. Transmission electron microscopyElectron beam induced deposition of rhodium from the precursor [RhCl(PF3)2]2: morphology, structure and chemical compositiontext::journal::journal article::research article