Smith, R.Kloeck, B.de Rooij, N. F.Collins, S. D.2009-05-122009-05-122009-05-12198710.1016/0022-0728(87)85168-9https://infoscience.epfl.ch/handle/20.500.14299/39857The Potential Dependence of Silicon Anisotropic Etching in KOH at 60ÝCtext::journal::journal article::research article