Macha, MichalJi, Hyun GooTripathi, MukeshZhao, YanfeiThakur, MukeshchandZhang, JingKis, AndrasRadenovic, Aleksandra2022-10-102022-10-102022-10-102022-09-0210.1039/d2na00409ghttps://infoscience.epfl.ch/handle/20.500.14299/191344WOS:000856043200001Among numerous thin film synthesis methods, metalorganic chemical vapor deposition performed in a showerhead reactor is the most promising one for broad use in scalable and commercially adaptable two-dimensional material synthesis processes. Adapting the most efficient monolayer growth methodologies from tube-furnace systems to vertical-showerhead geometries allows us to overcome the intrinsic process limitations and improve the overall monolayer yield quality. Here, we demonstrate large-area, monolayer molybdenum disulphide growth by combining gas-phase precursor supply with unique tube-furnace approaches of utilizing sodium molybdate pre-seeding solution spincoated on a substrate along with water vapor added during the growth step. The engineered process yields a high-quality, 4-inch scale monolayer film on sapphire wafers. The monolayer growth coverage, average crystal size and defect density were evaluated using Raman and photoluminescence spectroscopy, X-ray photoelectron spectroscopy, scanning electron microscopy and scanning transmission electron microscopy imaging. Our findings provide a direct step forward toward developing a reproducible and large-scale MoS2 synthesis with commercial showerhead reactors.Chemistry, MultidisciplinaryNanoscience & NanotechnologyMaterials Science, MultidisciplinaryChemistryScience & Technology - Other TopicsMaterials Sciencemonolayer mos2growthlayersheterostructuresdepositiongraphenefilmstext::journal::journal article::research article