Elimination of electromagnetic non-uniformities in large-area RF plasma reactors used for thin-film deposition

Howling, A.A.Sansonnens, L.Schmitt, J.P.M.Ballutaud, J.Schmidt, H.Hollenstein, Ch.2008-05-132008-05-132008-05-132004https://infoscience.epfl.ch/handle/20.500.14299/25251Elimination of electromagnetic non-uniformities in large-area RF plasma reactors used for thin-film depositiontext::conference output::conference paper not in proceedings