Uniformity of silicon microcrystallinity in large area RF capacitive reactors

Strahm, BenjaminHollenstein, ChristophHowling, Alan2008-12-152008-12-152008-12-15200810.1002/pip.857https://infoscience.epfl.ch/handle/20.500.14299/32667WOS:000261819800004microcrystalline siliconlarge areauniformityUniformity of silicon microcrystallinity in large area RF capacitive reactorstext::journal::journal article::research article