Wafer-scale fabrication of ultralow-loss silicon nitride nonlinear photonic circuits

Liu, JunqiuHe, JijunWang, Rui NingHuang, GuanhaoRaja, A. S.Lukashchuk, A.Anderson, M. H.Churaev, M.Siddharth, A.Engelsen, N. J.Karpov, M.Tikan, A.Lihachev, G.Riemensberger, J.Weng, W.Kippenberg, Tobias J.2021-10-232021-10-232021-10-232020-01-0110.1364/ACPC.2020.T4D.1https://infoscience.epfl.ch/handle/20.500.14299/182391WOS:000698627100259Recent advances in silicon nitride integrated photonics have achieved ultralow optical losses. Transferring this technology to standard commercial foundries, and merging it with silicon photonics via heterogeneous integration, will seed novel laser and quantum applications. (C) 2020 The Author(s)platformsWafer-scale fabrication of ultralow-loss silicon nitride nonlinear photonic circuitstext::conference output::conference proceedings::conference paper