Growth of Large-Area 2D MoS2 Arrays at Pre-Defined Locations Using Stencil Mask Lithography

Sharma, IntuBatra, YogitaFlauraud, VBrugger, JürgenMehta, Bodh Raj2018-07-052018-07-052018-03-0110.1166/jnn.2018.14265https://infoscience.epfl.ch/handle/20.500.14299/147112Electron AffinityFermi LevelKPFMMagnetron SputteringMoS2Raman MappingStencil Mask LithographyGrowth of Large-Area 2D MoS2 Arrays at Pre-Defined Locations Using Stencil Mask Lithographytext::journal::journal article::research article