Patterned thick photoresist layers for protection of protruding structures during wet and dry etching processes

Indermühle, P.-F.Roth, S.Dellmann, L.de Rooij, N. F.2009-05-122009-05-122009-05-12199810.1088/0960-1317/8/2/007https://infoscience.epfl.ch/handle/20.500.14299/39427Patterned thick photoresist layers for protection of protruding structures during wet and dry etching processestext::journal::journal article::research article