Bromann, K.Brune, H.Félix, C.Harbich, W.Monot, R.Buttet, J.Kern, K.2006-07-252006-07-25199710.1016/S0039-6028(96)01544-0https://infoscience.epfl.ch/handle/20.500.14299/232705Mass selected Ag/sub n/ clusters (n=1,7,19) from a secondary ion source have been deposited onto a Pt(111) substrate at low temperature. The surface and resulting cluster morphology have subsequently been characterized within the same UHV chamber by variable temperature STM as a function of cluster size, kinetic impact energy, and substrate temperature. The kinetic energy per cluster atom was found to be the decisive parameter for a controlled deposition. Noble gas buffer layers ( approximately=10 ML Ar), which were pre-adsorbed onto the surface at low temperatures, were found to efficiently dissipate the impact energy opening up the possibility of soft landing clusters with elevated kinetic energy.adsorbed layersargondiscontinuous metallic thin filmsion surface impactionised cluster beam depositionmetal clustersplatinumscanning tunnelling microscopysilversurface structure hard landingsoft landingmass selected Ag clustersPt111Pt111 substratesurfacecluster morphologyvariable temperature STMcluster sizekinetic impact energysubstrate temperaturekinetic energycontrolled depositionnoble gas buffer layersArpre adsorbed surfaceimpact energysoft landing clusterselevated kinetic energyAgPt A7920N (Atom molecule and ion surface impact)A6820 (Solid surface structure)A6855 (Thin film growth structure and epitaxy)A8115J (Ion plating and other vapour deposition)A6845B (Sorption equilibrium at solid fluid interfaces)A6146 (Solid clusters including fullerenes and nanoparticles)A79A68A81A61A7A6NucleationAggregationSelf-AssemblyEpitaxial Growthtext::journal::journal article::research article