Non-uniform rf plasma potential due to edge asymmetry in large-area rf reactors

Howling, A.A.Sansonnens, L.Ballutaud, J.Hollenstein, Ch.Schmitt, J.P.M.2008-04-182008-04-182008-04-182004https://infoscience.epfl.ch/handle/20.500.14299/23352LRP 788Non-uniform rf plasma potential due to edge asymmetry in large-area rf reactorstext::report