Wu, S.Klein, M. J. K.Vazquez-Mena, O.Auzelyte, V.Savu, V.Blondiaux, N.Montagne, F.Heinzelmann, H.Pugin, R.Brugger, J.2013-02-282013-02-282013-02-28201110.3850/978-981-07-0319-6_200https://infoscience.epfl.ch/handle/20.500.14299/90007WOS:000307677000047We present the fabrication of thin membranes with dense arrays of nanometer and submicrometer pore arrays by the integration of standard micromachining with three pore patterning techniques: electron beam lithography (EBL), nanosphere lithography (NSL) and aluminum anodization. Using a serial top-down EBL technique we exploit a fine size, positioning and flexibility of this tool. NSL and aluminum anodization, as self-organized bottom-up processes, guaranties cost efficiency and throughput. In our work, we have fabricated silicon nitride (SiN) and alumina (Al(2)O(0)3) membranes with a thickness down to 100 nm, side length ranging from 200 mu m up to 2.4 mm and pore size ranging from 20 nm to 500 nm.Solid-state nanopore array membraneselectron beam lithography (EBL)nanosphere lithography (NSL)aluminum anodizationmicrofabricationtext::conference output::conference proceedings::conference paper