Negative Ions Dynamics and Attachment-induced Ionization Instability in O2, CF4 and SF6 Low-pressure Modulated Capacitive RF Plasmas

Descoeudres, A.Sansonnens, L.Hollenstein, Ch.2008-05-132008-05-132008-05-132002https://infoscience.epfl.ch/handle/20.500.14299/25066Negative Ions Dynamics and Attachment-induced Ionization Instability in O2, CF4 and SF6 Low-pressure Modulated Capacitive RF Plasmastext::conference output::conference proceedings::conference paper