Charging dynamics of localized 2D layers of Si nanocrystals embedded into SiO2 by stencil masked ultra low energy ion implantation process

Dumas, C.Grisolia, J.Carrey, J.Arbouet, A.Paillard, V.BenAssayag, G.Schamm, S.Bonafos, C.van den Boogaart, M.A.F.Savu, V.Brugger, J.Normand, P.2009-03-032009-03-032009-03-032008https://infoscience.epfl.ch/handle/20.500.14299/35747Charging dynamics of localized 2D layers of Si nanocrystals embedded into SiO2 by stencil masked ultra low energy ion implantation processtext::conference output::conference proceedings::conference paper