Pinto-Gomez, ChristianPerez-Murano, FrancescBausells, JoanVillanueva, Luis GuillermoFernandez-Regulez, Marta2020-11-242020-11-242020-11-242020-10-0110.3390/polym12102432https://infoscience.epfl.ch/handle/20.500.14299/173535WOS:000585376700001Directed self-assembly of block copolymers is a bottom-up approach to nanofabrication that has attracted high interest in recent years due to its inherent simplicity, high throughput, low cost and potential for sub-10 nm resolution. In this paper, we review the main principles of directed self-assembly of block copolymers and give a brief overview of some of the most extended applications. We present a novel fabrication route based on the introduction of directed self-assembly of block copolymers as a patterning option for the fabrication of nanoelectromechanical systems. As a proof of concept, we demonstrate the fabrication of suspended silicon membranes clamped by dense arrays of single-crystal silicon nanowires of sub-10 nm diameter. Resulting devices can be further developed for building up high-sensitive mass sensors based on nanomechanical resonators.Polymer Scienceblock copolymersdirected self-assemblygraphoepitaxynanolithographynanomechanical devicesnanowiresps-b-pmmachemical-patternsmicrophase separationthin-filmsdensity multiplicationinteraction parameterorientation controltriblock copolymerchain-endlithographytext::journal::journal article::review article