van der Wal, P. D.Briand, D.Mondin, G.Jenny, S.Jeanneret, S.Millon, C.Roussel, H.Dubourdieu, C.de Rooij, N. F.2009-05-122009-05-122009-05-122006https://infoscience.epfl.ch/handle/20.500.14299/39995CVD deposited TA2O5 and HfO2 layers as pH-sensitive layers for ISFETstext::conference output::conference proceedings::conference paper